Journal of Uncertain Systems, World Academic Union (World Academic Press)

Microelectronics technological processes are most complicated and consist of many un-predicted factors on the final device parameters. Thin films deposition methods based on magnetron plasma sputtering are influenced by lots of independent active factors. These deposition methods bring along uncertainty in the precise design process of electronic components. Thus, intelligent modeling process is highly important in the design of multi-factors microelectronics system. In this paper we present a novel approach to the deposition process of various thin films, using mathematical modeling of sputtering processes and random section method. Highly transparent and conductive indium oxide films were deposited using this mathematical modeling of magnetron sputtering method. In addition, tantalum oxide resistive thin films, with predicted properties were grown using the same method and the predicted properties were experimentally obtained. © 2007 World Academic Press, UK. All rights reserved.